Ion Beams in Materials Processing and Analysis

<p>Preface</p><p>1. Introduction</p><p>2. Fundamentals</p><p>3. Ion Beam Technology</p><p>3.1 Principles of Ion Accelerators</p><p>3.1.1 Low Energy Ion Accelerators (Ion Implanters)</p><p>3.1.2 High Energy Ion Accelerators</p><p>3.2 Ion Sources</p><p>3.2.1 Hot Filament (Hot Cathode) Ion Sources</p><p>3.2.2 Cold Cathode Ion Source (Penning Ion Source)</p><p>3.2.3 High Frequency (RF) Ion Source</p><p>3.2.4 Duoplasmatron Ion Source</p><p>3.2.5 Ion Sources for Electrostatic Accelerators</p><p>3.2.6 Cesium Sputtering Ion Sources</p><p>3.2.7 Field-Evaporation or Liquid Metal Ion Sources (LMIS)</p><p>3.2.8 Beam Extraction from Ion Sources</p><p>3.3 Ion Acceleration</p><p>3.4 Ion Beam Handling</p><p>3.4.1 Ion Mass Separation</p><p>3.4.2 Ion Beam Focusing</p><p>3.4.3 Ion Beam Scanning</p><p>3.4.4 Ion Beam Current Measurement</p><p>3.4.5 Ion Detection (Detectors, Spectrometers)</p><p>3.5 Ion Implantation Systems</p><p>3.5.1 Common Low Energy Beam Line Implanters</p><p>3.5.2 Specialized Low Energy Beam Line Implanters</p><p>3.5.3 High Energy Beam Line Implanters</p><p>3.5.4 Plasma Based Ion Implanters (PBII)</p><p>3.6 Electrostatic Ion Accelerator Systems</p><p>3.6.1 Single-Stage Electrostatic Accelerators</p><p>3.6.2 Two-Stage Electrostatic Accelerators</p><p>3.7 Focused Ion Beam Systems</p><p>3.7.1 Low Energy Focused Ion Beams</p><p>3.7.2 High Energy Focused Ion Beams</p><p>4. Materials Processing</p><p>4.1 Ion Irradiation and Damage Annealing</p><p>4.2 Ion Implantation into Semiconductors</p><p>4.2.1 Ion Implantation into Silicon</p><p>4.2.1.1 Advanced CMOS Technology</p><p>4.2.1.2 Defect Engineering and Epi-Layer Replacing in High Power Devices</p><p>4.2.1.3 Silicon Detector and Sensor Technology</p><p>4.2.2 Ion Implantation into Germanium</p><p>4.2.3 Ion Implantation into Compound Semiconductors</p><p>4.2.3.1 III-V Semiconductors</p><p>4.2.3.2 Group III-Nitride Materials</p><p>4.2.3.3 Silicon Carbide</p><p>4.3 Ion Beam Synthesis of New Phases in Solids</p><p>4.3.1 Buried Insulating Layers in Silcon</p><p>4.3.2 Ion Beam Synthesized Silicide Layers</p><p>4.3.3 Ion Beam Synthesis of Nanocrystals in Insulators</p><p>4.4 Ion Beam Mixing of Interfaces</p><p>4.5 Ion Beam Slicing of Thin Layers (Smart-Cut for SOI and Solar Cells)</p><p>4.6 Ion Beam Erosion, Sputtering and Surface Patterning (Ripples)</p><p>4.7 Ion Beam Shaping of Nanomaterials</p><p>4.8 Ion Beam Processing of other Materials (Metals, Insulators, Polymers...)</p><p>4.8.1 Ion Implantation of Metals</p><p>4.8.2 Ion Implantation into Polymers</p><p>4.8.3 Ion Implantation into Insulating Optical Materials</p><p>5. Ion Beam Preparation of Materials</p><p>5.1 Displacement of Target Atoms by Sputtering</p><p>5.2 Effects on Sputtering Yield</p><p>5.2.1 Ion Energy and Ion Atomic Number</p><p>5.2.2 Ion Incident Direction</p><p>5.2.3 Selective Sputtering</p><p>5.2.4 Targert Material</p><p>5.2.5 Preferential Sputtering</p><p>5.3 Ion Beam Induced Target Modifications</p><p>5.3.1 Ion Beam Cleaning and Etching</p><p>5.3.2 Ion Beam Induced Material Deposition</p><p>5.3.3 Ion Beam Depth Profiling</p><p>5.3.4 Ion Beam Cutting</p><p>5.3.5 Ion Beam Thinning</p><p>5.4 Focus Ion Beam (FIB) Preparation</p><p>5.4.1 FIB Induced Cross Section Preparation </p><p>5.4.2 FIB Induced Thin Film Preparation</p><p>5.4.3 Limiting Effects at FIB Preparation</p><p>6. Ion Beam Analysis of Materials</p><p>6.1 Ion- Solid State Interactions</p><p>6.2 Ion Beam Analytical Techniques – a Survey</p><p>6.3 Ion Beam Scattering Techniques</p><p>6.3.1 Rutherford Backscattering (RBS)</p><p>6.3.2 Medium Energy Ion Scattering (MEIS)</p><p>6.3.3 Elastic Recoil Detection Analysis (ERDA)</p><p>6.4 Ion Beam Induced Photon Emission</p><p>6.4.1 Particle Induced X-Ray Emission (PIXE)</p><p>6.4.2 Particle Induced γ-Ray Emission (PIGE)</p><p>6.5 Nuclear Reaction Analysis (NRA)</p><p>6.6 Ion Beam Induced Light and Electron Emission</p><p>6.7 Secondary Ion Emission</p><p>6.7.1 Dynamic Secondary Ion Mass Spectrometry (Dynamic SIMS)</p><p>6.7.2 Static Secondary Ion Mass Spectrometry (Static SIMS)</p><p>6.7.3 Sputtered Neutral Particle Mass Spectrometry (SNMS)</p><p>6.8 Ion Beam Imaging Techniques</p><p>6.8.1 Field Ion Microscopy</p><p>6.8.2 Ion Microscopy with Stationary Beam</p><p>6.8.3 Scanning Ion Microscopy<p>7. Special Ion Beam Applications in Materials Analysis Problems</p><p>7.1 Functional Thin Films and Layers</p><p>7.1.1 Direct Study of Diffusion Pricesses in Amorphous Thin Layer Systems</p><p>7.1.2 Nanoanalytical Investigations of Tunnelmagnetoresistance Layers</p><p>7.2 Ion Beam Analysis in Art and Archeometry</p><p>7.3 Special Applications in Life Sciences</p><p>Index</p></p><p>7. Special Ion Beam Applications in Materials Analysis Problems</p><p>7.1 Functional Thin Films and Layers</p><p>7.1.1 Direct Study of Diffusion Pricesses in Amorphous Thin Layer Systems</p><p>7.1.2 Nanoanalytical Investigations of Tunnelmagnetoresistance Layers</p><p>7.2 Ion Beam Analysis in Art and Archeometry</p><p>7.3 Special Applications in Life Sciences</p><p>Index</p>