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Machine Learning-Based Modelling in Atomic Layer Deposition Processes

Specificaties
Paperback, 354 blz. | EN
Taylor & Francis Ltd | e druk, 2025
ISBN13: 9781032386737
Rubricering
Taylor & Francis Ltd e druk, 2025 9781032386737
€ 80,43
Levertijd ongeveer 15 werkdagen

Samenvatting

This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control.

Specificaties

ISBN13:9781032386737
Taal:EN
Bindwijze:Paperback
Aantal pagina's:354
Uitgever:Taylor & Francis Ltd
€ 80,43
Levertijd ongeveer 15 werkdagen

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        Machine Learning-Based Modelling in Atomic Layer Deposition Processes