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Rapid Thermal Processing of Semiconductors

Specificaties
Gebonden, 358 blz. | Engels
Springer US | 1997e druk, 1997
ISBN13: 9780306450549
Rubricering
Springer US 1997e druk, 1997 9780306450549
Onderdeel van serie Microdevices
€ 264,99
Levertijd ongeveer 8 werkdagen

Samenvatting

Rapid thermal processing has contributed to the development of single wafer cluster processing tools and other innovations in integrated circuit manufacturing environments. Borisenko and Hesketh review theoretical and experimental progress in the field, discussing a wide range of materials, processes, and conditions. They thoroughly cover the work of international investigators in the field.

Specificaties

ISBN13:9780306450549
Taal:Engels
Bindwijze:gebonden
Aantal pagina's:358
Uitgever:Springer US
Druk:1997

Inhoudsopgave

Transient Heating of Semiconductors by Radiation. Recrystallization of Implanted Layers and Impurity Behavior in Silicon Crystals. Crystallization, Impurity Diffusion and Segregation in Polycrystalline Silicon. Component Evaporation, Defect Annealing and Impurity Diffusion in the III-V Semicondutors. Diffusion Synthesis of Silicides in Thin Film Metal-Silicon Structures. Rapid Thermal Oxidation and Nitridation. Rapid Thermal Chemical Vapor Deposition. Indexes.
€ 264,99
Levertijd ongeveer 8 werkdagen

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        Rapid Thermal Processing of Semiconductors