Advances in Imaging and Electron Physics
Specificaties
Gebonden, blz.
|
Engels
Elsevier Science |
e druk, 2019
ISBN13: 9780128171776
Rubricering
Onderdeel van serie
Advances in Imaging and Electron Physics
Levertijd ongeveer 8 werkdagen
Samenvatting
Advances in Imaging and Electron Physics, Volume 209, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy and the computing methods used in all these domains.
Specificaties
Inhoudsopgave
<p>1. Introduction to EELS<br>Alberto Eljarrat Ascunce<br>2. Low-loss EELS methods<br>Alberto Eljarrat Ascunce<br>3. DFT modeling of wurtzite III-nitride ternary alloys<br>Alberto Eljarrat Ascunce<br>4. AlN/GaN and InAlN/GaN DBRs<br>Alberto Eljarrat Ascunce<br>5. Multiple InGaN QW heterostructure<br>Alberto Eljarrat Ascunce<br>6. Er-doped Si-nc/SiO2 multilayer<br>Alberto Eljarrat Ascunce<br>7. Si-NCs embedded in dielectric matrices<br>Alberto Eljarrat Ascunce<br>8. EELS Conclusions<br>Alberto Eljarrat Ascunce<br>9. High-Tc Superconductors and Magnetic Electron Lenses<br>Jan-Peter Adriaanse</p>