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3D IC Stacking Technology

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Gebonden, blz. | Engels
McGraw-Hill Education | e druk, 2011
ISBN13: 9780071741958
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McGraw-Hill Education e druk, 2011 9780071741958
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The latest advances in three-dimensional integrated circuit stacking technology

With a focus on industrial applications, 3D IC Stacking Technology offers comprehensive coverage of design, test, and fabrication processing methods for three-dimensional device integration. Each chapter in this authoritative guide is written by industry experts and details a separate fabrication step. Future industry applications and cutting-edge design potential are also discussed. This is an essential resource for semiconductor engineers and portable device designers.

3D IC Stacking Technology covers:High density through silicon stacking (TSS) technologyPractical design ecosystem for heterogeneous 3D IC productsDesign automation and TCAD tool solutions for through silicon via (TSV)-based 3D IC stackProcess integration for TSV manufacturingHigh-aspect-ratio silicon etch for TSVDielectric deposition for TSVBarrier and seed depositionCopper electrodeposition for TSVChemical mechanical polishing for TSV applicationsTemporary and permanent bondingAssembly and test aspects of TSV technology

Specificaties

ISBN13:9780071741958
Taal:Engels
Bindwijze:gebonden

Inhoudsopgave

Chapter 1. Introduction to High-Density Through Silicon Stacking Technology<br>Chapter 2. A Practical Design Eco-System for Heterogeneous 3D IC Products<br>Chapter 3. Design Automation and TCAD Tool Solutions for Through Silicon Via-Based 3D IC Stack<br>Chapter 4. Process Integration for TSV Manufacturing<br>Chapter 5. High-Aspect-Ratio Silicon Etch for TSV<br>Chapter 6. Dielectric Deposition for Through Silicon Vias<br>Chapter 7. Barrier and Seed Deposition<br>Chapter 8. Copper Electrodeposition for TSV<br>Chapter 9. Chemical Mechanical Polishing for TSV<br>Chapter 10. Temporary and Permanent Bonding<br>Chapter 11. Assembly and Test Aspects of TSV Technology<br>Index
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        3D IC Stacking Technology