Diederik Depla,
Stijn Mahieu
Springer Berlin Heidelberg
0e druk, 2010
9783642095368
Reactive Sputter Deposition
Specificaties
Paperback, 572 blz.
|
Engels
Springer Berlin Heidelberg |
0e druk, 2010
ISBN13: 9783642095368
Rubricering
Onderdeel van serie
Springer Series in Materials Science
Levertijd ongeveer 8 werkdagen
Samenvatting
In this valuable work, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, are described in detail, allowing the reader to understand the complete process. Hence, this book gives necessary information for those who want to start with reactive magnetron sputtering, understand and investigate the technique, control their sputtering process and tune their existing process, obtaining the desired thin films.
Specificaties
ISBN13:9783642095368
Taal:Engels
Bindwijze:paperback
Aantal pagina's:572
Uitgever:Springer Berlin Heidelberg
Druk:0
Inhoudsopgave
Simulation of the Sputtering Process.- Electron Emission from Surfaces Induced by Slow Ions and Atoms.- Modeling of the Magnetron Discharge.- Modelling of Reactive Sputtering Processes.- Depositing Aluminium Oxide: A Case Study of Reactive Magnetron Sputtering.- Transport of Sputtered Particles Through the Gas Phase.- Energy Deposition at the Substrate in a Magnetron Sputtering System.- Process Diagnostics.- Optical Plasma Diagnostics During Reactive Magnetron Sputtering.- Reactive Magnetron Sputtering of Indium Tin Oxide Thin Films: The Cross-Corner and Cross-Magnetron Effect.- Reactively Sputter-Deposited Solid Electrolytes and Their Applications.- Reactive SputteredWide-Bandgap p-Type Semiconducting Spinel AB2O4 and Delafossite ABO2 Thin Films for “Transparent Electronics”.- Oxide-Based Electrochromic Materials and Devices Prepared by Magnetron Sputtering.- Atomic Assembly of Magnetoresistive Multilayers.