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Intense Electron and Ion Beams

Specificaties
Paperback, 281 blz. | Engels
Springer Berlin Heidelberg | 0e druk, 2010
ISBN13: 9783642063442
Rubricering
Springer Berlin Heidelberg 0e druk, 2010 9783642063442
Verwachte levertijd ongeveer 9 werkdagen

Samenvatting

Intense Ion and Electron Beams treats intense charged-particle beams used in vacuum tubes, particle beam technology and experimental installations such as free electron lasers and accelerators. It addresses, among other things, the physics and basic theory of intense charged-particle beams; computation and design of charged-particle guns and focusing systems; multiple-beam charged-particle systems; and experimental methods for investigating intense particle beams. The coverage is carefully balanced between the physics of intense charged-particle beams and the design of optical systems for their formation and focusing. It can be recommended to all scientists studying or applying vacuum electronics and charged-particle beam technology, including students, engineers, and researchers.

Specificaties

ISBN13:9783642063442
Taal:Engels
Bindwijze:paperback
Aantal pagina's:281
Uitgever:Springer Berlin Heidelberg
Druk:0

Inhoudsopgave

to Particle-Beam Formation.- Methods of Fields Calculation.- Fundamentals of Charged-Particle Motion.- Motion of Intense Charged-Particle Beams.- Electron Guns.- Electron and Ion Sources with Field and Plasma Emitters.- Magnetic Focusing Systems.- Electrostatic Focusing Systems.- Optical Systems of Technological Installations.- Intense Relativistic Charged-Particle Beams.- Multiple-Beam Electron-Optical Systems.- Methods of Experimental Investigation of Beams.

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        Intense Electron and Ion Beams