Atomic Layer Growth and Processing: Volume 222

Featuring 46 papers from the 1991 MRS Spring Meeting (April 29 - May 3, Anaheim, California), this volume focuses on the technologically challenging field of atomic layer growth and processing. The concept of atomic layer based processing is perhaps a primary road to both the degree of control and processing uniformity for both etching and deposition that the future demands of the semiconductor industry require. Research areas covered include: mechanistic studies of atomic layer processes; characterization of atomic layer processes; III-V semiconductor studies; group IV semiconductor studies; II-VI semiconductor studies; high Tc superconductors and other materials.