Victor E. Borisenko,
Peter J. Hesketh
Springer US
0e druk, 2013
9781489918062
Rapid Thermal Processing of Semiconductors
Specificaties
Paperback, 358 blz.
|
Engels
Springer US |
0e druk, 2013
ISBN13: 9781489918062
Rubricering
Onderdeel van serie
Microdevices
Verwachte levertijd ongeveer 9 werkdagen
Samenvatting
Rapid thermal processing has contributed to the development of single wafer cluster processing tools and other innovations in integrated circuit manufacturing environments. Borisenko and Hesketh review theoretical and experimental progress in the field, discussing a wide range of materials, processes, and conditions. They thoroughly cover the work of international investigators in the field.
Specificaties
ISBN13:9781489918062
Taal:Engels
Bindwijze:paperback
Aantal pagina's:358
Uitgever:Springer US
Druk:0
Serie:Microdevices
Inhoudsopgave
Transient Heating of Semiconductors by Radiation. Recrystallization of Implanted Layers and Impurity Behavior in Silicon Crystals. Crystallization, Impurity Diffusion and Segregation in Polycrystalline Silicon. Component Evaporation, Defect Annealing and Impurity Diffusion in the III-V Semicondutors. Diffusion Synthesis of Silicides in Thin Film Metal-Silicon Structures. Rapid Thermal Oxidation and Nitridation. Rapid Thermal Chemical Vapor Deposition. Indexes.