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Ion Beam Analysis

Fundamentals and Applications

Specificaties
Paperback, 472 blz. | Engels
CRC Press | 1e druk, 2019
ISBN13: 9780367445843
Rubricering
CRC Press 1e druk, 2019 9780367445843
Verwachte levertijd ongeveer 11 werkdagen

Samenvatting

Ion Beam Analysis: Fundamentals and Applications explains the basic characteristics of ion beams as applied to the analysis of materials, as well as ion beam analysis (IBA) of art/archaeological objects. It focuses on the fundamentals and applications of ion beam methods of materials characterization.

The book explains how ions interact with solids and describes what information can be gained. It starts by covering the fundamentals of ion beam analysis, including kinematics, ion stopping, Rutherford backscattering, channeling, elastic recoil detection, particle induced x-ray emission, and nuclear reaction analysis. The second part turns to applications, looking at the broad range of potential uses in thin film reactions, ion implantation, nuclear energy, biology, and art/archaeology.

Examines classical collision theory

Details the fundamentals of five specific ion beam analysis techniques

Illustrates specific applications, including biomedicine and thin film analysis

Provides examples of ion beam analysis in traditional and emerging research fields

Supplying readers with the means to understand the benefits and limitations of IBA, the book offers practical information that users can immediately apply to their own work. It covers the broad range of current and emerging applications in materials science, physics, art, archaeology, and biology. It also includes a chapter on computer applications of IBA.

Specificaties

ISBN13:9780367445843
Taal:Engels
Bindwijze:Paperback
Aantal pagina's:472
Uitgever:CRC Press
Druk:1

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        Ion Beam Analysis