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Theory and Application of Laser Chemical Vapor Deposition

Specificaties
Gebonden, 396 blz. | Engels
Springer US | 1995e druk, 1995
ISBN13: 9780306449369
Rubricering
Springer US 1995e druk, 1995 9780306449369
€ 180,99
Levertijd ongeveer 8 werkdagen

Samenvatting

In this monograph, the authors offer a comprehensive examination of the latest research on Laser Chemical Vapor Deposition (LCVD). Chapters explore the physics of LCVD as well as the principles of a wide range of related phenomena-including laser-matter interactions, heat transfer, fluid flow, chemical kinetics, and adsorption. With this reference, researchers will discover how to apply these principles to developing theories about various types of LCVD processes; gain greater insight into the basic mechanisms of LCVD; and obtain the ability to design and control an LCVD system.

Specificaties

ISBN13:9780306449369
Taal:Engels
Bindwijze:gebonden
Aantal pagina's:396
Uitgever:Springer US
Druk:1995

Inhoudsopgave

1. Introduction.- 2. Pyrolytic LCVD.- 3. Photolytic LCVD.- 4. Pyrolytic LCVD Modeling.- 5. Photolytic LCVD Modeling.- A.1. Definitions of Energy Density, Irradiance, and Intensity.- A.2. Thermal Stress Analysis.- A.3. Volumetric Absorption Rate.- Nomenclature.- References.
€ 180,99
Levertijd ongeveer 8 werkdagen

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        Theory and Application of Laser Chemical Vapor Deposition