M. (Professor, Professor, Hachinohe Institute of Technology, Japan) Sugawara,
,
M. Sugawara
e druk, 1998
9780198562870
Plasma Etching
Fundamentals and Applications
Specificaties
Gebonden, 356 blz.
|
Engels
|
e druk, 1998
ISBN13: 9780198562870
Rubricering
Onderdeel van serie
Series on Semiconductor Science and Technology
Levertijd ongeveer 10 werkdagen
Samenvatting
The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.
Specificaties
ISBN13:9780198562870
Taal:Engels
Bindwijze:Gebonden
Aantal pagina's:356